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Automatic Direct Plasma Cleaning System RPD-5
  • Automatic Direct Plasma Cleaning System RPD-5

Automatic Direct Plasma Cleaning System RPD-5

ApplicationsThe system is perfectly used for cleaning and surface activation prior to semiconductor packaging process such as

Applications

The system is perfectly used for cleaning and surface activation prior to semiconductor packaging process such as die bonding, wire bonding, underfill, molding, etc., capable to effectively remove the surface contaminants of organics and oxides from the packaging materials, excellently enhancing the bonding strength and adhesion performance, thus significantly improving the process yield. With automatic substrates or lead frames loading and unloading assembly, the system is featured with fast cleaning cycle and high cleaning uniformity, particularly suitable for highly demanding production where very high performance of cleaning results is mandatory.


Features

Enhanced surface treatment for all products. 

Consistent high-uniformity cleaning for all position of products 

Multiple operation and display for all process steps 

Automatic 4 lanes transferring with loading/unloading (max 6 lanes)

Automatic quick conversion of lane width for product changeover

High throughput productivity (450 strips/h for 5 lanes)

Unique air cooling design in chamber bottom 

Touch screen IPC & PLC based control system 


Specifications

Plasma Frequency

13.56MHz (radio frequency)

Plasma Power

Standard 600W, (optional 1000W)

Generator Cooling

Air cooling at chamber bottom

Product Size

Length: Max. 260mm

Width: 30-60mm(5 lanes); 30-80mm (4 lanes), over 80mm (1-3 lanes)

Thickness: Max.1mm

Lanes

Standard 4 lanes (Max 6 lanes)

Lane Width

30-60mm(5 lanes), 30-80mm (4 lanes), over 80mm (1-3 lanes), automatic quick conversion

SPH

450 strips (for 5 lanes)

Chamber Size (internal)

W280mm x D440mm x H55mm

Mass Flow Controllers

Standard 1 ( up to 2), flow rate 100sccm each

Vacuum Gauge

Pirani or capacitance manometer

Vacuum Pump

Dry pump, built-in type, 1000L/Min@50Hz

Control System

Windows based touchscreen IPC + PLC control, supporting manual and automatic operation, process recipe program editing/storage/execution, and automatic process data recording and display. Supports MES system.

Enclosure Dimension

W1080mm x D1800mm x H1500mm (tower lamp excluded)

Weight

Approx. 700Kg

Power Supply

AC380V, 3P+N+PE, 50Hz, 5kW

Vent Gas

N2, 0.4MPa

Process Gas

Ar, Ar/H2 forming gas, O2, etc., 0.15-0.2MPa

CDA

0.5-0.6MPa


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